Abstract

This international standard relates to a conductivity measurement method of thin metal films at microwave and millimeter-wave frequencies. This method provides conductivity measurements of a metal foil used for adhering to a substrate or the interfacial conductivity of a metal layer formed on a dielectric substrate. The method utilizes higher-order mode resonances of a balanced-type circular-disk resonator (BCDR) for providing broadband measurements with a single resonator. The document provides information on the theory, equipment, procedures, and applicable range of the method.

Begin

2023-10-18

Planned document number

DIN EN IEC 63616

Project number

02231880

Responsible national committee

DKE/UK 412.4 - Passive HF- und Mikrowellenbauelemente  

draft standard

Measurement of the conductivity for metal thin films at microwave and millimeter-wave frequencies - Balanced-type circular disk resonator method (IEC 63616:2025); German version EN IEC 63616:2026
2026-07
Order from DIN Media