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Standards [CURRENT]

DIN 50452-2

Testing of materials for semiconductor technology - Test method for particle analysis in liquids - Part 2: Determination of particles by optical particle counters
Edition 2009-10

Standards [CURRENT]

DIN 50452-3

Testing of materials for semiconductor technology - Test method for particle analysis in liquids - Part 3: Calibration of optical particle counters
Edition 1995-10

Standards [CURRENT]

DIN 50453-1

Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 1: Silicium monocrystals, gravimetric method
Edition 2023-08

Standards [CURRENT]

DIN 50453-2

Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 2: Silicon-dioxide coating, optical method
Edition 2023-08

Standards [CURRENT]

DIN 50455-1

Testing of materials for semiconductor technology - Methods for characterizing photoresists - Part 1: Determination of coating thickness with optical methods
Edition 2009-10

Standards [CURRENT]

DIN 50455-2

Testing of materials for semiconductor technology - Methods for the characterisation photoresists - Part 2: Determination of photosensitivity of positive photoresists
Edition 1999-11

Standards [CURRENT]

DIN 50460

Determination of magnetic properties of soft magnetic materials; general, terminology and principles of measurement
Edition 1988-08

Standards [CURRENT]

DIN 50472

Testing of permanent magnets; determination of the magnetic flux values in the working range
Edition 1981-03

Standards [CURRENT]

DIN 50504

Chemical analysis of copper and copper alloys; photometric determination of iron in copper and copper alloys containing 0,4 % of iron at maximum
Edition 1973-10

Standards [CURRENT]

DIN 50506

Chemical analysis of copper and copper alloys; photometric determination of nickel in copper alloys containing 2,5 % of nickel at maximum
Edition 1973-10

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